DRY FILM PHOTORESIST

摘要

The present invention relates to a dry film photoresist, and more particularly to a dry film photoresist which can improve resolution by performing an exposure process in a removed state of a supporting film to prevent bad influence of an exposure effect due to the supporting film. In addition, the high resolution can be obtained by preventing the lowering of the transparency or the reduction of the developing speed while the exposure process is performed in presence of a resin protection layer. Particularly, the resin protection layer according to the present invention can reduce the manufacturing cost and the haze by reducing the wetting agent content such as polysilicon, can prevent the lowering of the haze by suppressing the damage of the resin protection layer, and can obtain the high resolution by preventing the reduction of the developing duration.