| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film manufacturing device capable of stably supplying a process gas without causing piping choking of a supply system. SOLUTION: The thin-film manufacturing device 60 includes at least a reactor 29 forming a thin film on a substrate, a first supply path L10 for supplying a first process gas to a reactor 29, a second supply path L20 for supplying a second process gas to the reactor 29, and a third supply path L30 for supplying a cleaning gas to the reactor 29, wherein a confluence point G where the second supply path L20 and the third supply path L30 meet each other is provided in the vicinity of the reactor 29, and the second supply path L20 and third supply path L30 are provided with blocking means 22 and 32 of blocking the paths respectively in the upstream side of the confluence point G. COPYRIGHT: (C)2011,JPO&INPIT
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