| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a removable cover for protecting a reticle used in a lithography system. <P>SOLUTION: A removable cover includes a frame and a thin film supported by the frame. Since the thin film is transparent to an inspection wavelength, the reticle can be inspected with the removable cover placed in a predetermined position. The removable cover protects the reticle when the removable cover is placed in the predetermined position and is removal in performing exposure by lithography. The removable cover may further include at least one reticle fastener. When the removable cover is placed in the predetermined position, at least one reticle fastener applies force to the reticle, thereby preventing the removable cover from moving relative to the reticle. <P>COPYRIGHT: (C)2011,JPO&INPIT |
