| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cooling system and a cooling method for a grazing-incidence collector (GIC) used in extreme ultraviolet (EUV) lithography. <P>SOLUTION: The cooling system includes a plurality of cooling lines 30 spaced apart to form a circle. The cooling lines are disposed on a plurality of planes PL oriented vertically to a central axis AC of a shell and parallel to one another and are disposed around the outer periphery of a rear surface in thermal contact with the rear surface of the shell. Flow-in side second cooling liquid manifold and flow-out side second cooling liquid manifold 44, 46 are respectively fluid-connected with the plurality of cooling lines. Thus, the cooling liquid flows from the flow-in side second cooling liquid manifold to the flow-out side second cooling liquid manifold via two semi-circular flow passages of each cooling line. Thermal gradients that may induce shell surface local deformations leading to degraded focusing performance are reduced by separating a liquid flow-in position from a flow-out position of the cooling liquid. <P>COPYRIGHT: (C)2011,JPO&INPIT |
