| 摘要 |
An imprint apparatus for performing alignment between a mold and a substrate and imprinting a pattern of the mold to a layer of the substrate. A holder holds the mold. A stage holds the substrate opposite to the mold held by the holder. A microscope, including an image pickup device, detects a first alignment mark formed in the mold, via a first image pickup area of the image pickup device, and detects a second alignment mark formed in the substrate, via a second image pickup area of the image pickup device. The first and second image pickup areas do not overlap with each other. A contrast of signals obtained by the image pickup device is adjusted with respect to each of the first and second image pickup areas, and the alignment is performed by changing relative positions of the holder and the stage based on first information about a deviation of the detected first alignment mark from a predetermined position in the first image pickup area and second information about a deviation of the detected second alignment mark from a predetermined position in the second image pickup area. |
