VACUUM DEPOSITION APPARATUS AND MAINTENANCE METHOD THEREFOR

摘要

Disclosed is a vacuum deposition apparatus which can separate an evaporation source from the atmosphere, while suppressing complication of the configuration of the apparatus and a size increase of the apparatus. The vacuum deposition apparatus is provided with a deposition chamber (13), which is subjected to vacuum, and an evaporation source unit (50). The evaporation source unit (50) has the evaporation source (51), a container (52), and seal mechanisms (53a, 53b), and is disposed in the deposition chamber (13). The evaporation source (51) generates vapor of an evaporation material (100). The container (52) forms a containing chamber (521) which contains the evaporation source (51), and the container has openings (522a, 522b), through which the vapor of the evaporation material (100) is supplied from the containing chamber (521) to the deposition chamber (13). The seal mechanisms (53a, 53b) are disposed on the container (52), and are configured such that the seal mechanisms can hermetically close the openings (522a, 522b).