发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics. |
申请公布号 |
US2011147752(A1) |
申请公布日期 |
2011.06.23 |
申请号 |
US201113037927 |
申请日期 |
2011.03.01 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI |
分类号 |
G02F1/1335;H01L33/60;G02F1/136;G02F1/1368;G09F9/30;H01L21/00;H01L21/3205;H01L21/336;H01L21/77;H01L21/84;H01L23/52;H01L27/12;H01L29/04;H01L29/786 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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