THIN FILM DEPOSITION SYSTEM AND METHODOF DEPOSITING FILM USING THE SAME

摘要

PURPOSE: A thin film deposition system and a method of depositing a film using the same are provided to improve step coverage by supplying sufficient vaporized raw gas to a thin film deposition system. CONSTITUTION: In a thin film deposition system and a method of depositing a film using the same, a raw gas supply unit(210) supplies a raw gas. A material gas supply unit comprises a vaporizer in which the raw gas is provided from the raw gas supply unit is vaporized A thin film deposition system(100) is connected to the raw gas supply unit and deposits vaporized raw material on a target. One end of an exhaust pipe is connected to the vaporizer and discharge the gas inside the vaporizer. A pressure regulator is connected to the exhaust pipe. The pressure regulator controls the pressure of the exhaust pipe to control the flow rate of the raw material supplied into the vaporizer.