发明名称 APPARATUS AND METHOD FOR TREATING SUBSTRATES
摘要 PURPOSE: An apparatus and a method for processing substrates are provided to prevent the generation of mist on a monitoring window by inhaling fume using an inhaling nozzle at a position adjacent to the monitoring mirror. CONSTITUTION: A processing chamber(111) includes a space(112) in which operational processes with respect to a substrate(11) are implemented. A monitoring window(116) monitors the inside of the processing chamber. A substrate supporting unit supports the substrate. A spraying nozzle(131) sprays chemical toward the substrate. A main pipe(163) exhausts fume generated in the processing chamber to the outside.
申请公布号 KR101042322(B1) 申请公布日期 2011.06.17
申请号 KR20100000419 申请日期 2010.01.05
申请人 SEMES CO., LTD. 发明人 KIM, JUNG KYU
分类号 H01L21/02;H01L21/00 主分类号 H01L21/02
代理机构 代理人
主权项
地址