| 发明名称 |
Removal of Masking Material |
| 摘要 |
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate.
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| 申请公布号 |
US2011140181(A1) |
申请公布日期 |
2011.06.16 |
| 申请号 |
US20090636015 |
申请日期 |
2009.12.11 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
AFZALI-ARDAKANI ALI;COOPER EMANUEL ISRAEL;KHOJASTEH MAHMOUD;NUNES RONALD W.;TOTIR GEORGE GABRIEL |
| 分类号 |
H01L29/78;B08B3/08;B32B3/00;G03F7/20;G03F7/42;H01L29/84 |
主分类号 |
H01L29/78 |
| 代理机构 |
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