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发明名称
Multi chamber plasma process system
摘要
申请公布号
EP1744345(B1)
申请公布日期
2011.06.15
申请号
EP20050254638
申请日期
2005.07.26
申请人
GEN CO., LTD.
发明人
WI, SOON-IM
分类号
H01J37/32
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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