| 摘要 |
<p>PURPOSE: A lithography apparatus and a sealing apparatus for the lithography apparatus are provided to control the interval of a first body and a second body by implementing the command of a controller. CONSTITUTION: A second body(B2) is moved with respect to a first body(B1). A seal(SD) is arranged between the first body and the second body. A first space(S1) is separated from a second space(S2) by the first body, the second body, and the seal. The seal is located at a position separated from the first body. A fluid supplying part(FS) generates the flow of fluid between the first body and the seal. A controller controls the interval of the first body and the second body.</p> |
