发明名称 SEMICONDUCTOR DEVICE WITH IMPROVED ESD PROTECTION
摘要 The present invention relates to a semiconductor device, comprising a semiconductor substrate (102) with a thickness of less than 100 micrometer and with a first substrate side and an opposite second substrate side. A plurality of at least four monolithically integrated Zener or avalanche diodes (164,166,168,170) with a reverse breakdown voltage of less than 20 V are defined in the semiconductor substrate and connected with each other in a series connection. The diodes are defined in a plurality of mutually isolated substrate islands (120,122,124,126) in the semiconductor substrate, at least one diode per substrate island. The substrate islands are laterally surrounded by through-substrate isolations extending from the first to the second substrate side and comprising a filling (128) that electrically isolates a respective substrate island from a respective laterally surrounding area of the semiconductor substrate.
申请公布号 US2011121425(A1) 申请公布日期 2011.05.26
申请号 US20080739333 申请日期 2008.10.22
申请人 NXP B.V. 发明人 YANNOU JEAN-MARC;VAN ZWOL JOHANNES;SAVIN EMMANUEL
分类号 H01L29/866;H01L21/762 主分类号 H01L29/866
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