发明名称 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM HAVING SUBSTRATE LIQUID PROCESSING PROGRAM STORED THEREIN
摘要 PROBLEM TO BE SOLVED: To prevent the occurrence of electrostatic breakdown caused by the discharge of electric charges accumulated in a substrate. SOLUTION: The invention relates to a substrate liquid processing apparatus (1), a substrate liquid processing method for processing the substrate (2) with a liquid, and a computer-readable storage medium (48) having a substrate liquid processing program stored therein. Prior to processing a circuit-forming surface of the substrate (2) with the substrate processing chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate (2) by an anti-static liquid, thereby emitting the electric charges on the substrate (2). COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011103438(A) 申请公布日期 2011.05.26
申请号 JP20100180668 申请日期 2010.08.12
申请人 TOKYO ELECTRON LTD 发明人 TANAKA YUJI;MINAMI TERUOMI;KAWABUCHI YOSUKE;ITO KIKO;KAMIMURA FUMIHIRO;YABUTA TAKASHI;KOSAI KAZUKI;UNO TAKASHI;SEKIGUCHI KENJI;FUJII YASUSHI
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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