| 摘要 |
PURPOSE: A method of filling a gap is provided to improve the gap fill efficiency by depositing a gap fill insulating layer by using a deposition suppression gas and deposition promotion gas. CONSTITUTION: In a method of filling a gap, a plurality of patterns(210) are formed on a substrate(10). A passive layer(220) is formed in the substrate and pattern. The passive layer reduce the deposition speed of a gap fill layer(230) using a deposition suppression gas according to the gap fill insulating layer. The gap fill layer is deposited from the base part of the patterns by using the deposition gas and a reaction gas The deposition suppression gas is supplied together with the deposition gas and the reaction gas. |
