发明名称 |
IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME |
摘要 |
A method for fabricating image sensor is disclosed. The method includes the steps of: providing a substrate, wherein the substrate comprises a plurality of photodiodes; forming at least one dielectric layer and a passivation layer on surface of the substrate; using a patterned photomask to perform a first pattern transfer process for forming a plurality of trenches corresponding to each photodiode in the passivation layer; forming a plurality of color filters in the trenches; covering a planarizing layer on the color filters; and using the patterned photomask to perform a second pattern transfer process for forming a plurality of microlenses corresponding to each color filter on the planarizing layer.
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申请公布号 |
US2011108715(A1) |
申请公布日期 |
2011.05.12 |
申请号 |
US20090615268 |
申请日期 |
2009.11.10 |
申请人 |
CHEN CHI-CHUNG;CHIANG WEN-CHEN;LIN YU-TSUNG |
发明人 |
CHEN CHI-CHUNG;CHIANG WEN-CHEN;LIN YU-TSUNG |
分类号 |
H01L31/0232 |
主分类号 |
H01L31/0232 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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