发明名称 UTILIZATION OF ORGANIC BUFFER LAYER TO FABRICATE HIGH PERFORMANCE CARBON NANOELECTRONIC DEVICES
摘要 <p>PURPOSE: A method for using an organic buffer layer to manufacture a high performance carbon nano electronic device is provided to obtain good leakage properties using NFC-100 and a graphene. CONSTITUTION: A channel material is deposited on a substrate to form a channel(1205). A source metal contact and a drain metal contact are deposited on the channel material. The source metal contact and the drain metal contact are installed in the facing ends of the channel material. A polyhydroxy styrene derivative is deposited on the channel material(1215). A top gate oxide is deposited on a polymer layer(1220). Top gate metal is deposited on the top gate oxide(1225).</p>
申请公布号 KR20110049702(A) 申请公布日期 2011.05.12
申请号 KR20100108098 申请日期 2010.11.02
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FARMER DAMON BROOKS;AVOURIS PHAEDON;XIA FENGNIAN
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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