发明名称 |
UTILIZATION OF ORGANIC BUFFER LAYER TO FABRICATE HIGH PERFORMANCE CARBON NANOELECTRONIC DEVICES |
摘要 |
<p>PURPOSE: A method for using an organic buffer layer to manufacture a high performance carbon nano electronic device is provided to obtain good leakage properties using NFC-100 and a graphene. CONSTITUTION: A channel material is deposited on a substrate to form a channel(1205). A source metal contact and a drain metal contact are deposited on the channel material. The source metal contact and the drain metal contact are installed in the facing ends of the channel material. A polyhydroxy styrene derivative is deposited on the channel material(1215). A top gate oxide is deposited on a polymer layer(1220). Top gate metal is deposited on the top gate oxide(1225).</p> |
申请公布号 |
KR20110049702(A) |
申请公布日期 |
2011.05.12 |
申请号 |
KR20100108098 |
申请日期 |
2010.11.02 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FARMER DAMON BROOKS;AVOURIS PHAEDON;XIA FENGNIAN |
分类号 |
H01L21/336;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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