| 摘要 |
Method of manufacturing a non-volatile memory device on a semiconductor substrate in a memory area, said non-volatile memory device comprising a cell stack of a first semiconductor layer, a charge trapping layer and an electrically conductive layer, the charge trapping layer being the intermediate layer between the first semiconductor layer and the electrically conductive layer, the charge trapping layer comprising at least a first insulating layer; the method comprising:—providing the substrate having the first semiconductor layer;—depositing the charge trapping layer;—depositing the electrically conductive layer;—patterning the cell stack to form at least two non-volatile memory cells, and—creating a shallow trench isolation in between said at least two non-volatile memory cells.
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