发明名称 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE
摘要 An illumination system is disclosed that has a plurality of moveable reflective elements (22a, 22b, 22c) and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element (22a, 22b, 22c) between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element (22a, 22b, 22c) forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
申请公布号 WO2011023419(A1) 申请公布日期 2011.03.03
申请号 WO2010EP53539 申请日期 2010.03.18
申请人 ASML NETHERLANDS B.V.;DE VRIES, GOSSE;BUIS, EDWIN;VAN DAM, MARINUS;VAN SCHOOT, JAN;BOON, FIDELUS;KREUWEL, HERMANUS 发明人 DE VRIES, GOSSE;BUIS, EDWIN;VAN DAM, MARINUS;VAN SCHOOT, JAN;BOON, FIDELUS;KREUWEL, HERMANUS
分类号 G03F7/20 主分类号 G03F7/20
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