PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING DEVICE

摘要

Disclosed is a plasma processing apparatus wherein damages due to plasma generated in a discharge container are reduced and the replacement cycle of the discharge container is lengthened. The plasma processing apparatus (1) is provided with: a processing chamber (2) which demarcates a processing space; the discharge container (3), which has one end facing the inside of the processing chamber (2) opened, and the other end closed; an antenna (4), which is disposed at the periphery of the discharge container (3), generates an induction electric field, and generates plasma inside of the depressurized discharge container (3); and an electromagnet (9), which is disposed at the periphery of the discharge container (3) and forms a divergent magnetic field inside of the discharge container (3). A protruding section (15) which protrudes toward the processing chamber is formed on the closed end portion of the discharge container (3).