| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve in-plane line width uniformity within each mask even when the kind of the mask is different. <P>SOLUTION: This invention relates to a charged particle beam drawing device 10 including a drawing chamber 10a2 provided with a movable stage 10a2a for mounting the mask M configured by applying resist on the upper surface of a mask substrate and an optical lens barrel 10a1 for irradiating with a charged particle beam 10a1b for drawing a pattern on the resist. The charged particle beam drawing device 10 is provided with a charged particle beam irradiation amount correction part 10b1a for correcting the irradiation amount of the charged particle beam 10a1b from the optical lens barrel 10a1 to the resist on the basis of a proximity effect and fogging, and a conversion coefficient change part 10b1a2 for changing a conversion coefficient which is the ratio of the storage energy of the charged particle beam 10a1b stored in the resist and the accumulated irradiation amount of the charged particle beam 10a1b stored in the resist on the basis of a pattern density on the resist and a position on the resist. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
