发明名称 ELECTROPLATING APPARATUS
摘要 The present invention relates to an electroplating apparatus which comprises: a plating vessel containing electrolyte solution; and a supply unit which is connected to the plating vessel and which sprays the electrolyte solution containing metallic ions for electroplating onto specific parts of the object to be plated, wherein said supply unit is connected to an anode, and the object to be plated is connected to a cathode.
申请公布号 WO2010120158(A3) 申请公布日期 2011.02.03
申请号 WO2010KR02425 申请日期 2010.04.19
申请人 KMW INC.;KIM, DUK-YONG;KIM, SANG-YONG;SEO, BONG-WON 发明人 KIM, DUK-YONG;KIM, SANG-YONG;SEO, BONG-WON
分类号 C25D5/02;C25D17/00;C25D17/06;C25D17/10;C25D21/06 主分类号 C25D5/02
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