发明名称 Laser apparatus, laser irradiation method, and manufacturing method of semiconductor device
摘要 It is an object to provide a laser apparatus, a laser irradiating method and a manufacturing method of a semiconductor device that can perform uniform a process with a laser beam to an object uniformly. The present invention provides a laser apparatus comprising an optical system for sampling a part of a laser beam emitted from an oscillator, a sensor for generating an electric signal including fluctuation in energy of the laser beam as a data from the part of the laser beam, a means for performing signal processing to the electrical signal to grasp a state of the fluctuation in energy of the laser beam, and controlling a relative speed of an beam spot of the laser beam to an object in order to change in phase with the fluctuation in energy of the laser beam.
申请公布号 US7881350(B2) 申请公布日期 2011.02.01
申请号 US20070730973 申请日期 2007.04.05
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 MIYAIRI HIDEKAZU;SHIMOMURA AKIHISA;TAKANO TAMAE;KOYAMA MASAKI
分类号 H01S3/10;B23K26/08;B23K26/42;H01L21/00;H01S3/00;H01S3/13;H01S3/225 主分类号 H01S3/10
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