发明名称 |
Laser apparatus, laser irradiation method, and manufacturing method of semiconductor device |
摘要 |
It is an object to provide a laser apparatus, a laser irradiating method and a manufacturing method of a semiconductor device that can perform uniform a process with a laser beam to an object uniformly. The present invention provides a laser apparatus comprising an optical system for sampling a part of a laser beam emitted from an oscillator, a sensor for generating an electric signal including fluctuation in energy of the laser beam as a data from the part of the laser beam, a means for performing signal processing to the electrical signal to grasp a state of the fluctuation in energy of the laser beam, and controlling a relative speed of an beam spot of the laser beam to an object in order to change in phase with the fluctuation in energy of the laser beam.
|
申请公布号 |
US7881350(B2) |
申请公布日期 |
2011.02.01 |
申请号 |
US20070730973 |
申请日期 |
2007.04.05 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
MIYAIRI HIDEKAZU;SHIMOMURA AKIHISA;TAKANO TAMAE;KOYAMA MASAKI |
分类号 |
H01S3/10;B23K26/08;B23K26/42;H01L21/00;H01S3/00;H01S3/13;H01S3/225 |
主分类号 |
H01S3/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|