SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF USING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD

摘要

PURPOSE: A lithography apparatus substrate table, a lithography apparatus, a method of using a substrate table, and a device manufacturing method are provided to improve the overlay accuracy of patterns formed on a substrate by reducing the possibility of generating the bubble or discharging the liquid. CONSTITUTION: A substrate table(WT) supports a substrate(W). The substrate table comprises a flat upper side(21). A recess(22) is positioned to accept and support the substrate on the flat upper side. A gap(23) is located between the edge of the substrate and edge of the recess. A cover(25) is expanded from the peripheral unit of the upper side of the substrate to the upper side of the substrate table.