发明名称 |
Microlithographic reduction projection catadioptric objective |
摘要 |
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
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申请公布号 |
US7859748(B2) |
申请公布日期 |
2010.12.28 |
申请号 |
US20070686157 |
申请日期 |
2007.03.14 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
SHAFER DAVID R.;HUDYMA RUSSELL;ULRICH WILHELM |
分类号 |
G02B17/08;G03F7/20;H01L21/027 |
主分类号 |
G02B17/08 |
代理机构 |
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代理人 |
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地址 |
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