ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which reduces coating defects and enables provision of an excellent pattern even in immersion exposure, and a pattern forming method using the same.

SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin which is decomposed by the action of an acid and exhibits increased solubility in an alkali developer; (B) a compound which generates an acid upon irradiation with actinic rays or radiation; (C) a resin having at least either a fluorine atom or a silicon atom and a polarity conversion group which is decomposed by the action of an alkali developer and exhibits increased solubility in the alkali developer; and (D) a mixed solvent containing at least one solvent selected from the group represented by general formulae (S1)-(S3), wherein the total content of the solvent is 3-20 mass% in all solvents.

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