发明名称 DEVICE AND METHOD FOR ALIGNMENT, AND SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an alignment technique capable of further improving registration. <P>SOLUTION: An alignment device calculates misregistration between both objects based on a superimposed image being an overlapping image of first and second patterns arranged on both the objects, and corrects the misregistration by driving both the objects relatively. The superimposed image has a first periodic concentration change (moire) generated by superimposing a first line group (pitch p1) of the first pattern and a second line group (pitch p2) of the second pattern, and also has a second periodic concentration change generated by superimposing a second line group of the first pattern and a first line group of the second pattern. A calculation means of the alignment device obtains two approximate curves approximating the two periodic concentration changes by image processing, and calculates misregistration between both the objects based on the misregistration between the two approximate curves. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010267682(A) 申请公布日期 2010.11.25
申请号 JP20090115969 申请日期 2009.05.12
申请人 BONDTECH INC;SUGA TADATOMO 发明人 SUGA TADATOMO;O SHINGI;YAMAUCHI AKIRA
分类号 H01L21/027;H01L21/02 主分类号 H01L21/027
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