METHOD FOR REPAIRING PIN HOLE OF PHOTOMASK USING SELF ASSEMBLY MOLECULE

摘要

PURPOSE: A pin hole modifying method of a photo-mask is provided to modify generated pin holes without increasing the processing time regardless of the size of the pin holes. CONSTITUTION: A pin hole modifying method of a photo-mask using a self assembled molecular layer comprises the following steps: forming a mask on a transparent substrate(200) with a light shielding pattern; detecting a pin hole(215) by performing a defect test process; forming a resist film pattern(225) exposing the transparent substrate exposed by the detected pin hole; forming a first self assembled molecular layer(235) on one end of the transparent substrate; and burying the pin hole with a second self assembled molecular layer by supplying a solution containing a light barrier material(240).