| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color filter which is superior in color reproducibility by suppressing contrast reduction and color mixture due to deflection cancellation. <P>SOLUTION: The color filter is manufactured by: exposing/developing/baking a photosensitive deep color layer using a photosensitive deep color composition including a light-shielding material having an average particle size of ≤20 nm, on a substrate to form a black matrix (BM); and furthermore exposing/developing/baking a photosensitive color layer using a photosensitive color composition on a BM-formed surface of the substrate to form color patterns. An acute angle θ made by lines L1 and L2 in the BM after baking is >0 to 80°, wherein the L1 is a line parallel with a substrate surface in a range of 0.9h (h is a distance from the substrate surface to the farthest point) from the substrate surface and the line L2 is a tangent at an intersection between the line L1 and a BM contour line; and at least one of color patterns satisfies Tk≥β/α×(T<SB>0</SB>-T), wherein α is a density per unit thickness of the BM, β is a maximum density per unit thickness of the color pattern, T<SB>0</SB>is a thickness of the photosensitive color layer, Tk is a BM thickness of a part where the BM and the color pattern overlap, and T is a thickness of the color pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT |
