| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflective composition capable of achieving a low refractive index layer that shows high pencil hardness, excellent in scratch resistance and adhesiveness while having sufficiently low refractive index, and to provide an anti-reflection film having a layer formed by curing the composition, a polarizing plate and an image display device. <P>SOLUTION: The composition for the anti-reflection layer contains (A) at least two kinds of silica particles each having a different average particle size, (B) a cationic polymerizable compound expressed by a general formula (1), and (C) a cationic photopolymerization initiator. Among at least the two kinds of silica particles (A) each having a different average particle size, at least one kind is a hollow silica particle and at least one kind is a colloidal silica particle. In the general formula (1), R<SP>1</SP>expresses a 1-10C cationic polymerizable group, R<SP>2</SP>expresses a group selected from among a methyl group, an ethyl group and a propyl group, and (n) expresses any one of 0, 1 and 2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
