VARIABLE TEMPERATURE METHOD FOR TUNABLE ELECTROSTATIC CHUCK

摘要

PROBLEM TO BE SOLVED: To provide an etching method in which etching process controllability is improved. SOLUTION: An etching processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor for informing a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to keep the temperature of the chuck at a selectable setting temperature. A first setting temperature and a second setting temperature are selected. The wafer is placed on the chuck and set to the first setting temperature. The wafer is then processed at the first setting temperature for a first period of time and at the second setting temperature for a second period of time. COPYRIGHT: (C)2010,JPO&INPIT