发明名称 POWER SUPPLY DEVICE FOR PLASMA PROCESSING
摘要 A power supply device for plasma processing, wherein electric arcs may occur, comprises a power supply circuit for generating a voltage across output terminals, and a first switch connected between the power supply circuit and one of the output terminals. According to a first aspect the power supply device comprises a recovery energy circuit connected to the output terminals and to the power supply circuit. According to a second aspect the power supply device comprises an inductance circuit including an inductor and a second switch connected parallel to the inductor. According to a third aspect the power supply device comprises a controller for causing the power supply circuit and the first switch to be switched on and off. The controller is configured to determine a quenching time interval by means of a self-adaptive process. The quenching time interval defines the time interval during which, in an event of an arc, no voltage is generated across the output terminals.
申请公布号 US2010211230(A1) 申请公布日期 2010.08.19
申请号 US20100701813 申请日期 2010.02.08
申请人 BULLIARD ALBERT;FRAGNIERE BENOIT;OEHEN JOEL;CARDOU OLIVIER 发明人 BULLIARD ALBERT;FRAGNIERE BENOIT;OEHEN JOEL;CARDOU OLIVIER
分类号 G06F1/28 主分类号 G06F1/28
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