| 摘要 |
An exposure apparatus of the present invention is an exposure apparatus which exposes a pattern of an original plate 3 onto a substrate 5, and the exposure apparatus comprises an original plate alignment detection system 13 which moves the original plate 3 in an in-plane direction at an outside of an exposure region to measure positions of a plurality of alignment marks of the original plate 3, an interferometer 23 which measures a position of the original plate alignment detection system 13, a calculator which calculates a position and a shape of the original plate 3 from the positions of the plurality of alignment marks, and a correction unit which performs a correction in accordance with the position and the shape of the original plate 3 during exposure.
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