| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of smoothly performing liquid immersion exposure on a plurality of substrates each provided with a plurality of types of photoresist layers. <P>SOLUTION: When a substrate is exposed by an image of a pattern being projected onto the substrate through a projection optical system and a liquid, a liquid immersion condition optimal for a film member to be formed on a liquid contact surface of the substrate is selected from among liquid immersion conditions stored in a storage device. <P>COPYRIGHT: (C)2010,JPO&INPIT |
