发明名称 Method for forming a stacked structure of an insulating layer and an organic semiconductor layer, organic field effect transistor and method for making same
摘要 A method for making an organic field effect transistor of a bottom gate/bottom contact type or a bottom gate/top contact type is provided. The method comprises (a) forming a gate electrode 12 on a support and forming a gate insulating layer 13 on the support 10 and the gate electrode 12, and (b) forming, on the gate insulating layer 13, source/drain electrodes 14 and an organic semiconductor region 15 made of an organic semiconductor material and constituting a channel forming region 16. The gate insulating layer 12 is formed by applying a solution of a mixture of an insulating polymer material and a surface treating agent onto the support 10 and the gate electrode 12 and drying. The organic field effect transistors are also provided.
申请公布号 US7767488(B2) 申请公布日期 2010.08.03
申请号 US20060424672 申请日期 2006.06.16
申请人 SONY CORPORATION 发明人 YONEYA NOBUHIDE
分类号 H01L51/40 主分类号 H01L51/40
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