发明名称 |
TEST PATTERN OF THE SEMICONDUCTOR DEVICE AND MEASURING THE THICKNESS OF FUSE USING THE SAME |
摘要 |
PURPOSE: A test pattern of a semiconductor device and a method for measuring the thickness of a fuse using the same are provided to improve the accuracy of fuse blowing by measuring the thickness of a fuse pattern. CONSTITUTION: A test pattern(110) of a semiconductor device comprises a first pattern and a second pattern. The first pattern comprises the same form as a fuse pattern(105). A second pattern is arranged in zigzag pattern to connect the first patterns. The first pattern and the second pattern are etched identically with the fuse pattern. The first pattern is a line pattern. A plurality of first patterns is formed. A pad pattern(120) is formed on the center and both ends of the test pattern.
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申请公布号 |
KR20100086846(A) |
申请公布日期 |
2010.08.02 |
申请号 |
KR20090006281 |
申请日期 |
2009.01.23 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
LEE, SEUNG JIN;CHOI, SANG DEUK |
分类号 |
H01L23/544;H01L21/66 |
主分类号 |
H01L23/544 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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