发明名称 TEST PATTERN OF THE SEMICONDUCTOR DEVICE AND MEASURING THE THICKNESS OF FUSE USING THE SAME
摘要 PURPOSE: A test pattern of a semiconductor device and a method for measuring the thickness of a fuse using the same are provided to improve the accuracy of fuse blowing by measuring the thickness of a fuse pattern. CONSTITUTION: A test pattern(110) of a semiconductor device comprises a first pattern and a second pattern. The first pattern comprises the same form as a fuse pattern(105). A second pattern is arranged in zigzag pattern to connect the first patterns. The first pattern and the second pattern are etched identically with the fuse pattern. The first pattern is a line pattern. A plurality of first patterns is formed. A pad pattern(120) is formed on the center and both ends of the test pattern.
申请公布号 KR20100086846(A) 申请公布日期 2010.08.02
申请号 KR20090006281 申请日期 2009.01.23
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, SEUNG JIN;CHOI, SANG DEUK
分类号 H01L23/544;H01L21/66 主分类号 H01L23/544
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