发明名称 |
Exposure apparatus and exposing method and method of manufacturing a printed wiring board |
摘要 |
The mask-less exposure apparatus includes: a stage which moves with the substrate having a photosensitive resin layer with sensitivity to ultraviolet radiation formed thereon; a first light source for emitting light containing a wavelength component in the wavelength range of 300 to 410 nm; a first light irradiation optical system for modulating a radiant flux emitted from the first light source based on data of a desired exposure pattern to image a pattern on the photosensitive resin layer; a second light source for emitting light containing a wavelength component in the wavelength range of 450 to 2500 nm; and a second light irradiation optical system for guiding a radiant flux emitted from the second light source to a second light irradiation area that is set so as to include at least a first light irradiation area.
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申请公布号 |
US7760328(B2) |
申请公布日期 |
2010.07.20 |
申请号 |
US20060370044 |
申请日期 |
2006.03.08 |
申请人 |
HITACHI VIA MECHANICS, LTD. |
发明人 |
YAMAGUCHI YOSHIHIDE;OYAMA HIROSHI |
分类号 |
G03B27/72 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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