发明名称 Semiconductor device
摘要 A high-speed and low-voltage DRAM memory cell capable of operating at 1 V or less and an array peripheral circuit are provided. A DRAM cell is comprised of a memory cell transistor and planar capacitor which utilize a FD-SOI MOST structure. Since there is no junction leakage current, loss of stored charge is eliminated, and the low-voltage operation can be realized. Further, a gate and a well in a cross-coupled type sense amplifier using FD-SOI MOSTs are connected. By this means, a threshold value dynamically changes and high-speed sensing operation can be realized.
申请公布号 US7759714(B2) 申请公布日期 2010.07.20
申请号 US20070768824 申请日期 2007.06.26
申请人 HITACHI, LTD. 发明人 ITOH KIYOO;TAKEMURA RIICHIRO
分类号 H01L27/108 主分类号 H01L27/108
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