| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a polymer compound for a photoresist which dissolves homogeneously in an alkaline developing liquid at the time of development, a polymer compound for the photoresist obtained by the above method, and a photoresist composition containing the same. <P>SOLUTION: This method for producing the polymer compound for the photoresist used for the production of a semiconductor element by radically polymerizing ≥2 kinds of polymerizable compounds having an ethylenic double bond is characterized by using a tubular reaction vessel containing a static agitator at its inside, and polymerizing by passing through a mixed solution containing the above ≥2 kinds of polymerizable compounds in an organic solvent continuously. The polymer compound for the photoresist obtained by the above method, and the composition for the photoresist containing the polymer compound for the photoresist are also provided. <P>COPYRIGHT: (C)2010,JPO&INPIT |
