| 摘要 |
PURPOSE: A heat processing device is provided to prevent impurities included in discharged gas from being attached to the inner wall of a discharging pipe path by heating the gas provided from a gas supplier based on a detection signal from a temperature detection sensor. CONSTITUTION: A heat plate(65) heats a processed substrate at a predetermined temperature. An exhaust pipe(66) is arranged on the upper side of a processing chamber and exhausts the gas inside the process chamber. An exhaust pipe path(67) is connected to the exhaust pipe. A gas supply unit(70) is installed in the exhaust pipe path. A control unit(75) controls the gas supply unit.
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