| 摘要 |
A system is provided for cleaning of probe contacts. The system includes a base plate comprising three mounting means for receiving each an adjustable attachment means, and means for connecting the base plate to a probe machine; and a cleaning plate comprising three holding means for receiving the respective adjustable attachment means, and a top area for cleaning probe contacts. The top area is between 60-100 mm times 75-100 mm, and the adjustable attachment means allows the cleaning plate to be leveled. A method for mounting in a probe machine such a system for cleaning of probe contacts is provided. The method includes connecting the base plate in the probe machine; connecting the cleaning plate to the base plate with the adjustable attachment means by mounting one of the adjustable attachment means as a reference, and mounting the two other adjustable attachment means for adjusting the level of the cleaning plate; and leveling the cleaning plate with the aid of measuring means for measuring distance held by the probe machine. The leveling includes repeating the following steps until the desired level is reached: moving the measuring means to a place on the cleaning plate top area that is substantially above the adjustable attachment means used as a reference and measure a reference value with the measuring means; moving the measuring means to a place on the cleaning plate top area that is substantially above one of the two adjustable attachment means for adjusting the level and adjust that attachment means until the measuring means reads substantially the same as the reference value; and moving the measuring means to a place on the cleaning plate top area that is substantially above the other of the two adjustable attachment means for adjusting the level and adjust that attachment means until the measuring means reads substantially the same as the reference value.
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