发明名称 Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part
摘要 An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part that surrounds a suction space, and a first support part that is provided in the suction space and that supports a substrate. Furthermore, the invention is equipped with a second support part that extends from the circumferential edge part to the first support part and that supports the substrate.
申请公布号 US2010141924(A1) 申请公布日期 2010.06.10
申请号 US20100656058 申请日期 2010.01.14
申请人 NIKON CORPORATION 发明人 SHIBAZAKI YUICHI
分类号 G03B27/58 主分类号 G03B27/58
代理机构 代理人
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