发明名称 CONTAMINANT REMOVING METHOD AND DEVICE, AND EXPOSURE METHOD AND APPARATUS
摘要 A method for quickly removing pollutants adhered to a predetermined optical member in an optical system. To remove the pollutants adhered to a lens (32A) disposed at the upper end of a projection optical system (PL), a cylindrical protecting member (53) is disposed through the openings in a reticle stage (22) and a reticle base (23). The bottom surface of a support section (56) at the tip section of a rod section (58) is brought into contact with the surface of the lens (32A) through the inner surface of the protecting member (53). A wiping cloth soaked with a washing solution containing hydrofluoric acid is attached to the bottom surface of the support section (56). The support section (56) is reciprocated via the rod section (58) to remove the pollutants on the lens (32A) with the wiping cloth. <IMAGE>
申请公布号 EP1586386(A4) 申请公布日期 2010.04.21
申请号 EP20030774200 申请日期 2003.11.25
申请人 NIKON CORPORATION 发明人 WATANABE, SHUNJI;HAMATANI, MASATO;KITAMOTO, TATSUYA
分类号 G02B27/00;G03F7/20;(IPC1-7):B08B3/08;G02B3/00;G03F7/22;H01L21/027 主分类号 G02B27/00
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