发明名称 METHOD FOR FORMING PATTERN USING NANO IMPRINT AND MANUFACTURING METHOD OF MOLD FOR FORMING PATTERN
摘要 <p>PURPOSE: A mold manufacturing method for a pattern casting method using nano-imprint and pattern casting molds the pattern of the multilevel form using a mold for a multi-stage imprint manufactured. It is applicable in the large area micro-pattern molding. CONSTITUTION: The polymer for the mold is patterned in the substrate patterning the ultraviolet lay blocking film and the mold is manufactured(100). The resin for imprint is spread in the formed substrate(102). The formed substrate spreading resin is pressurized to the mold and pattern is imprinted(104). Resin hardens(106). The resin for the imprint which does not harden is cleaned(108). The multi-stage pattern is shaped in the formed substrate(110).</p>
申请公布号 KR20100033311(A) 申请公布日期 2010.03.29
申请号 KR20080092430 申请日期 2008.09.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, YOUNG TAE;SIM, YOUNG SUK;KIM, JEONG GIL
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址