首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
A high vacuum magnetron sputter gun
摘要
申请公布号
KR100948547(B1)
申请公布日期
2010.03.18
申请号
KR20070128045
申请日期
2007.12.11
申请人
发明人
分类号
C23C14/35
主分类号
C23C14/35
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Semiconductor structure incorporating a contact sidewall spacer with a self-aligned airgap and a method of forming the semiconductor structure
Chip arrangement, a method for forming a chip arrangement, a chip package, a method for forming a chip package
Semiconductor element housing package and semiconductor device equipped with the same
Structure of thin nitride film and formation method thereof
Method for forming a self-aligned hard mask for contact to a tunnel junction
Increasing ION /IOFF ratio in FinFETs and nano-wires
Dual polysilicon gate of a semiconductor device with a multi-plane channel
Semiconductor device
Semiconductor device and method for manufacturing the same
Light emitting device
Light emitting device package
Semiconductor light emitting devices and submounts
Flexible semiconductor device, method for manufacturing the same, image display device using the same and method for manufacturing the image display device
Semiconductor device
Germanium electroluminescence device and fabrication method of the same
Group III nitride epitaxial laminate substrate
Photoelectric conversion element, production method thereof, photosensor, imaging device and their driving method
Method and device for machining a workpiece
Method for producing an integrated device
Process for generating electrical energy in a semiconductor device and the corresponding device