RADIATION-SENSITIVE RESIN COMPOSITION

摘要

A radiation-sensitive resin composition comprising a polymer (A), a radiation-sensitive acid generator (B), an acid diffusion inhibitor (C) and a solvent (D), wherein the polymer (A) has a repeating unit (a-1) represented by general formula (a-1) and the acid diffusion inhibitor (C) has at least one base selected from a base (C-1) represented by general formula (C-1) and a photodegradable base (C-2). [In general formula (a-1), R1's independently represent a hydrogen atom or the like; R represents a univalent group represented by general formula (a'); R19 represents a linear hydrocarbon group having 1 to 5 carbon atoms, or the like; A represents a divalent linear hydrocarbon group having 1 to 30 carbon atoms, or the like; and m and n independently represent an integer of 0 to 3 (provided that m + n = 1 to 3).  In general formula (C-1), R2 and R3 independently represent a univalent linear hydrocarbon group having 1 to 20 carbon atoms, or the like, provided that two R2's may together form a cyclic structure.]