发明名称 Predefined image pattern forming method for photosensitive layer attached on e.g. offset printing plate, involves allowing part of radiation to lie outside incompletely hardenable pixel and within completely hardenable pixel
摘要 <p>The method involves exposing a part of an incompletely hardenable pixel (21) using an amount of energy below a hardening-threshold value (Eth). A radiation is produced on a photosensitive layer (19) attached on a carrier substrate such that maximum energy density of a radiation, which is irradiated on the photosensitive layer for exposing the incompletely hardenable pixel, lies below the incompletely hardenable pixel. A part of the latter radiation is allowed to lie outside the incompletely hardenable pixel and within a completely hardenable pixel (20).</p>
申请公布号 DE102008045059(A1) 申请公布日期 2010.03.04
申请号 DE20081045059 申请日期 2008.09.01
申请人 UNIVERSITAET ROSTOCK 发明人 SALOMON, RALF;JOOST, RALF
分类号 G03F7/20 主分类号 G03F7/20
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