发明名称 Decal transfer lithography
摘要 A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
申请公布号 US7662545(B2) 申请公布日期 2010.02.16
申请号 US20040965279 申请日期 2004.10.14
申请人 THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS 发明人 NUZZO RALPH G.;CHILDS WILLIAM R.;MOTALA MICHAEL J.;LEE KEON JAE
分类号 G03F7/00 主分类号 G03F7/00
代理机构 代理人
主权项
地址