| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photoresist composition which is satisfactory in the basic physical properties, such as UV transmittance, residual film ratio, pattern safety and chemical resistance, not only superior in heat resistance, is used beneficially in the production of an organic insulating film, R.G.B., a black matrix, photospacers, a UV overcoat, etc., of a liquid crystal display, and is developed with an aqueous developer. <P>SOLUTION: The negative photoresist composition includes 3-50 wt.% of a specific binder resin containing a maleimide-based unit and a (meth)acrylic ester unit having an epoxy group-containing 1-10C alkyl or cycloalkyl group as a side chain, 2-40 wt.% of a polyvalent acryl monomer, 0.1-10 wt.% of a photoinitiator and 10-95 wt.% of an organic solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
