发明名称 HEAT RADIATION REFLECTING ARRANGEMENT STRUCTURE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a heat radiation reflecting arrangement structure in which heat radiation is reflected as much as possible in an infrared region of spectrum and is completely transmitted in a visible region of spectrum. <P>SOLUTION: The heat radiation reflecting arrangement structure with an improved high heat resistance to the temperature of 500°C or lower includes a substrate, a heat reflecting layer (A) on at least one side of the substrate which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains at least one metal oxide and at least one metal nitride. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010013345(A) 申请公布日期 2010.01.21
申请号 JP20090151856 申请日期 2009.06.26
申请人 SCHOTT AG 发明人 HENN CHRISTIAN;SCHMIDBAUER WOLFGANG;GABELMANN TORSTEN
分类号 C03C17/34;F24C15/04;F24C15/06 主分类号 C03C17/34
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