发明名称 |
HEAT RADIATION REFLECTING ARRANGEMENT STRUCTURE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF USING THE SAME |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a heat radiation reflecting arrangement structure in which heat radiation is reflected as much as possible in an infrared region of spectrum and is completely transmitted in a visible region of spectrum. <P>SOLUTION: The heat radiation reflecting arrangement structure with an improved high heat resistance to the temperature of 500°C or lower includes a substrate, a heat reflecting layer (A) on at least one side of the substrate which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains at least one metal oxide and at least one metal nitride. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010013345(A) |
申请公布日期 |
2010.01.21 |
申请号 |
JP20090151856 |
申请日期 |
2009.06.26 |
申请人 |
SCHOTT AG |
发明人 |
HENN CHRISTIAN;SCHMIDBAUER WOLFGANG;GABELMANN TORSTEN |
分类号 |
C03C17/34;F24C15/04;F24C15/06 |
主分类号 |
C03C17/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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